The CXL Consortium is looking forward to presenting at the annual OFA Workshop. The annual workshop fosters collaboration between those who develop fabrics, deploy fabrics, and create applications that rely on fabrics. The event enables fabric developers and users to discuss emerging fabric technologies, collaborate on future industry requirements, and address problems that exist today.
Topic: Composability Using CXL
Date and time: April 22 at 9:45 am PT
Speakers: Kurtis Bowman (AMD and CXL MWG Co-Chair) and Mitch Wright (Liqid)